ICS-3000 Ion Chromatography System
318 Doc. 065031-04 1/08
NOTE Do not use the same fine polishing pad to polish
more than one type of working electrode; this
can contaminate the electrode surface with
microparticles from the other working
electrodes.
c. Designate a pad that will not be used with polishing compound.
This pad is for removal of particles after polishing (see Step 5)
.
d. Moisten the suede side of the polishing pad slightly with water
and place the pad on a smooth, flat surface, with the suede side
facing up.
3. Polish the electrode:
• If you are polishing the electrode before initial installation, use
only the fine polishing compound.
• If you are polishing the electrode because of degradation of
performance, such as increased baseline noise or tailing peaks,
first use the coarse polishing compound. Then, repeat with the
fine compound.
a. Sprinkle about one-half gram of polishing compound in the
center of the suede side of the polishing pad. Add enough ASTM
Type I (18 megohm-cm) filtered and deionized water to make a
thick paste.
b. Using the working electrode block, spread the paste evenly over
the pad. Then, applying firm pressure in a figure eight motion,
polish the surface of the electrode block for about one minute. If
the pad dries out while polishing, add water sparingly. However,
never allow the polishing compound to dry on the cell body.
c. Use ASTM Type I (18 megohm-cm) filtered and deionized water
to rinse off all traces of polishing compound from the electrode
block. An ultrasonic cleaner is effective for thoroughly cleaning
the electrode block. Carefully rinse the surface of the block with
ASTM Type I (18 megohm-cm) filtered and deionized water.
4. If you used the coarse polishing compound in Step 3
, repeat the step
with the fine compound.
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