crius_II_en_00, Edition 06/2010
72 CONFIDENTIAL AIXTRON - Dokumentation
Description System Manual
Gas system CRIUS II
3
3.6.2 Run and vent lines
The CRIUS II is equipped with three run lines. They are used to lead the pro-
cess gas from the sources to the reactor chamber. Digital flow controllers con-
trol the process gas flow:
Run lines
• Hydride run line
Leads from the hydride sources to the lower plenum of the showerhead.
See Fig. 3-20, 71, item F.
• MO1 run line
Leads from the MO1 sources to the upper plenum of the showerhead.
See Fig. 3-20, 71, item J.
• MO2 run line
Leads from the MO2 sources to the upper plenum of the showerhead.
See Fig. 3-20, 71, item H.
Vent lines
For each run line, there is also a vent line. They lead past the reactor chamber
into the vacuum system. See Fig. 3-20, 71, item K.
Switching between run and vent lines
A 5/2-way valve is used to switch between a run and a vent line. The following
two states are possible:
To avoid pressure compensation reactions during the switching processes
between run and vent lines, the pressure in the run/vent lines and in the reac-
tor chamber will be held at the same level.
Open: The process gas flows through the run
line into the reactor. No process gas
flows in the vent line.
Closed: The process gas flows through the
vent line and passes the reactor. Only
carrier gas flows in the run line. H
2
is
normally used for this.
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