AIXTRON CRIUS II - Cleaning Procedures; Fused Quartz Glass Parts

crius_II_en_00, Edition 06/2010
146 CONFIDENTIAL AIXTRON - Dokumentation
Maintenance System Manual
Cleaning procedures CRIUS II
6
6.6 Cleaning procedures
6.6.1 Fused quartz glass parts
Solution
AIXTRON recommends using aqua regia:
This method works well for Arsenides and Phosphides as well as Antimonides.
It might not work well on Nitrides. For thin GaN layers the methode should be
applicable.
Etching time
The etching time will depend on amount of deposition. Account few hours.
Rinsing
Rinsing should be performed for 24 hours with running DI water. Rinse the
quartz parts thoroughly (8-10 rinsing cycles). The progress can be checked by
measuring drain water resistivity.
Drying
Drying should be performed in an oven (preferentially nitrogen-purged) with
100…150 °C for at least 12 hours.
HCl : HNO
3
3 : 1 or
HCl : HNO
3
5 : 1