Shimadzu GC-2010 Plus User Manual

3 AFC, APC
3.3
3.
35
GC-2010 Plus
3.3Flow Line Diagram
Fig. 3.3.1
S
CC
PP
H
M
A
H
H
M
A
Note: This figure illustrates an FID or FTD detector example. For ECD or TCD detectors, the APC controls only the makeup gas. For FPD detector, the APC controls only hydrogen and air.
CARRIER IN
(GC rear)
H
2
(GC rear)
MAKE UP
(GC rear)
AIR
(GC rear)
PURGE VENT
SPLIT VENT
APC
Column oven
Flow rate sensor
TFC (Flow rate sensor)
Pressure sensor
Pressure sensor
Pressure sensor
Pressure sensor
Column inlet pressure sensor
SPC
(Septum Purge Controller)
ESC
(Electronic Split Controller)
Trap
Trap
Molecular sieve filter
Valve for H
2
Valve for makeup gas
Valve for air
H
2
restrictor
Makeup gas restrictor
Air restrictor
Capillary column
Detector
Injection port
TFC:TOTAL FLOW CONTROLLER SPC:SEPTUM PURGE CONTROLLER ESC:ELECTRONIC SPLIT CONTROLLER
AFC
A
FC
TFC
SPC
ESC
A
PC

Shimadzu GC-2010 Plus Specifications

General

Type	Gas Chromatograph
Model	GC-2010 Plus
Manufacturer	Shimadzu
Maximum Temperature Ramp Rate	120 °C/min
Detector Options	FID, TCD, ECD, FPD, NPD, MS
Electronic Flow Control (EFC)	Yes
Data Sampling Rate	Up to 250 Hz
Column Oven Temperature Range	Ambient +5°C to 450°C
Maximum Oven Heating Rate	120 °C/min
Injection Port	Split/Splitless, PTV
Display	LCD