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Shimadzu GC-2010 Plus User Manual

Shimadzu GC-2010 Plus
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13 Detector
13.3 Thermal conductivity detector (TCD)
166
GC-2010 Plus
13.3.3.2 Parameter list
Make Up
Range: 0.020.0 ml/min, Default: 8.0 ml/min
The sensitivity increases as the difference of the thermal conductivity between the car-
rier gas and sample component.
For high sensitivity analysis, use helium with purity of 99.9995 % or more.
GAS TYPE
Selection: N
2/He/Ar, Default: He
OPTIMAL FLOW (Refer to Fig. 3.4.8.)
Normally, set the flow rate of the makeup gas to approx. 8 ml/min (Helimu).
NOTE If the makeup gas flow is set below the optimal rate (8 ml/min for Helimu), absolute sensitivity
increases. However, the reference filament can break, and peak tailing may occur. The baseline may
be come elevated after the solvent peak has eluted (depending on solvent type).
13.3.3.3 PF menu
PF menu Description
Reference
section
Program
The flow rate of makeup gas supplied to detector can be controlled by a
program.
13.3.3.4
On/Off
Select “Off” to stop the gas flow.
Select “On” to restart the gas flow.
Default value is “On”.
――
Stop Seq
For a TCD, the filament life can be shotened if the makeup gas flows stops
while the detector temperature is high. Therfore, the makeup gas contin-
ues to flow, until the detector temperature drops to a specified valve. The
default valve is 50 °C
――
Offset
Performs offset calibration of APC sensor.
This calibration improves the reproducibility of results.
3.6

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Shimadzu GC-2010 Plus Specifications

General IconGeneral
TypeGas Chromatograph
ModelGC-2010 Plus
ManufacturerShimadzu
Maximum Temperature Ramp Rate120 °C/min
Detector OptionsFID, TCD, ECD, FPD, NPD, MS
Electronic Flow Control (EFC)Yes
Data Sampling RateUp to 250 Hz
Column Oven Temperature RangeAmbient +5°C to 450°C
Maximum Oven Heating Rate120 °C/min
Injection PortSplit/Splitless, PTV
DisplayLCD

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