Sony MVS-8000X SystemMVS-7000X System - Pattern MIX

USO RESTRITO
164
Basic Procedure for Wipe Settings
Knob
Parameter
Adjustment
Setting values
1
No
Number of
points
3 to 64
2
Star Rate
Angularity of
star
–100.00 to
+100.00
a)
Knob
Parameter
Adjustment
Setting values
1
H Tile No
Number of tiles
horizontally
2 to 36
2
V Tile No
Number of tiles
vertically
2 to 18
Knob
Parameter
Adjustment
Setting values
1
Start
Position of start
tile
–100.00 to
+100.00
a)
2
Row No
Number of rows
of tiles
1 to 36
3
Phase
Delay for next
row
–100.00 to
+100.00
b)
Chapter
5
Wipes
2 Select the wipe pattern group with the pattern group
selection button.
Standard: standard wipes
Enhanced: enhanced wipes
Rotary: rotary wipes
Mosaic1 to Mosaic3: mosaic wipes
Random/Dust: random/diamond dust wipes
The patterns from the selected pattern group appear on
the screen.
For details of wipe patterns, see “Types of Wipe
Pattern” (page 163) and “Wipe Pattern List” (page
357) in Appendix.
3 Press the button to select the desired pattern.
4 The parameters change according to the selected
pattern, and you can adjust the pattern.
When a polygon wipe is selected (pattern number
49)
a) A value of –100.00 completely removes the star “rays,” leaving a
circle; at +100.00 the “rays” are at their sharpest.
When a mosaic wipe is selected (pattern numbers
200 to 203, 206 to 213, 224 to 247, 250 to 257, 260 to
269)
When a karaoke wipe is selected (pattern numbers
220 to 223)
a) At –100.00 tiles appear from the top (or left edge) of the screen; at
+100.00 from the bottom (or right edge) of the screen.
b) At –100.00 all rows appear simultaneously; at +100.00 until one row
of tiles is completely displayed, the next row does not start to appear.
When a random wipe is selected (pattern number
273)
Knob
Parameter
Adjustment
Setting values
1
H Size
Tile width
0.00 to 100.00
2
V Size
Tile height
0.00 to 100.00
3
Volatility
Rate of tile
generation
0.00 to 100.00
When a diamond dust wipe is selected (pattern
number 274)
Knob
Parameter
Adjustment
Setting values
1
H Size
Particle width
0.00 to 100.00
2
V Size
Particle height
0.00 to 100.00
3
Flash Rate
Rate of
generation of
particles
0.00 to 100.00
Notes
When Flash Rate is set to 0.00, you cannot change the
pattern. In this state, adjusting H Size or V Size has no
effect on the pattern.
For details of a pattern mix, see the next section.
For details of applying pattern modifiers, see “Setting
Wipe Modifiers” (page 166).
Pattern Mix
You can create a new pattern by combining two selected
patterns (main and “sub”).
Notes
It is not possible to apply a pattern mix to an independent
key transition.
Types of pattern mix
There are four ways in which patterns can be combined in
a pattern mix, as follows.
Mix: The effect of the sub pattern is applied to the main
pattern, modifying the outline or nature of the main
pattern.
Positive NAM (+Nam): Creates a pattern with an outline
which contains all points within the outlines of either
of the main pattern and the sub pattern.
Negative NAM (–Nam): Creates a pattern with an outline
which contains all points within the outlines of both of
the main pattern and the sub pattern.