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Sony MVS-8000X SystemMVS-7000X System - Setting Wipe Modifiers

Sony MVS-8000X SystemMVS-7000X System
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USO RESTRITO
166
Basic Procedure for Wipe Settings
Main
pattern
Sub pattern
Standard
Enhanced
Rotary
Mosaic
Random/
diamond
dust
Standard
Yes
Yes
No
Yes
Yes
Enhanced
Yes
Yes
No
Yes
Yes
Rotary
No
No
No
No
No
Mosaic
Yes
Yes
No
No
Yes
Random/
diamond
dust
Yes
Yes
No
Yes
No
Knob
Parameter
Adjustment
Setting values
1
Mix Ratio
Proportion of
sub pattern to
the main pattern
0.00 to 100.00
Knob
Parameter
Adjustment
Setting values
2
Start
Point in
transition at
which main
pattern is at
100%
50.00 to
+150.00
3
End
Point in
transition at
which sub
pattern is at
100%
50.00 to
+150.00
3
Select HF2 ‘Pattern Mix.’
The Pattern Mix menu appears.
4
In the <Pattern Mix> group, select the type of pattern
mix (see page 164).
Mix: mix
+Nam: positive Nam
Nam: negative Nam
Morphing: morphing
5
Depending on the selection in step 4, set the following
parameters.
When mix, positive Nam, or negative Nam is
selected
Chapter
5
Wipes
2 In the same way as for the main pattern, select the sub
pattern.
The patterns that can be selected for the sub pattern
depend on the pattern selected for the main pattern (see
the following table).
Yes: Combination possible No: Combination not possible
Full: fully linked mode
Semi: semi-linked mode
Applying the effect of a diamond dust wipe
to the selected pattern (Dust mix)
1
In the Pattern Mix menu, press [Dust Mix], turning it
on.
2
Set the following parameters as required.
Knob
Parameter
Adjustment
Setting values
1
Mix Ratio
Proportion of
diamond dust
pattern in mix
0.00 to 100.00
2
H Size
Particle width
0.00 to 100.00
3
V Size
Particle height
0.00 to 100.00
4
Flash Rate
Rate of
generation of
particles
0.00 to 100.00
You can also apply the dust mix function to the pattern
generated by a pattern mix.
Notes
When a random/diamond dust wipe (pattern numbers
270-274) is selected, the dust mix function is not
available.
Setting Wipe Modifiers
You can apply various modifiers to the wipe pattern:
setting the wipe direction, pattern position, and so on.
Note that the available modifiers may depend on the
pattern you are using (see page 174).
When morphing (see page 165) is selected
6 In the <Main/Sub Link> group, make the main/sub
modifier link function settings (see page 165).
Main pattern and sub pattern modifiers
You can make independent settings of the modifiers for the
main pattern and sub pattern.
To set the modifiers for the main pattern, in the M/E-1
>Wipe menu, select HF5 ‘Main Modify,’ and make the
settings in the Main Modify menu.
To set the modifiers for the sub pattern, select HF6 ‘Sub
Modify,’ and make the settings in the Sub Modify menu.
Operations in the Main Modify menu and Sub Modify
menu are the same.
Independently set modifiers for the main pattern
and sub pattern
Positioner
Rotation
Aspect ratio
Pattern replication (MULTI)
Pairing

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